Equipment
chamber: SF 6 , O 2 , Ar, CHF 3 , N 2 Oxford PlasmaLab 80Plus © LS MNE / TU Dortmund Description: Reactive Ion Etching (RIE) Features: Fluorine processes: SF 6 , O 2 , Ar, CHF 3 , N 2 Branson/IPC S2100 © [...] supported custom design Features: Provides O 2 , N 2 , Ar, Cl 2 , SiCl 4 , H 2 , N 2 O, CF 4 , CHF 3 , SF 6 , NH 3 , SiH 4 /Ar, SiH 2 Cl 2 Purita Ultrapure Water Supply © LS MNE / TU Dortmund Description: Ultrapure [...] Thermal ALD up to 500°C, Glovebox, Picozone™ PZ-100 ozone generator, Precursor: TMA, TEMAHf, H2O, NH3 Oxford PlasmaLab 80Plus © LS MNE / TU Dortmund Description: Plasma Enhanced Chemical Vapor Deposition …